Ammothermal Growth of Gan Substrates For Leds

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  • Release Date : 2011
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Book Description: Broad Funding Opportunity Announcement Project: The new GaN crystal growth method is adapted from that used to grow quartz crystals, which are very inexpensive and represent the second-largest market for single crystals for electronic applications (after silicon). More extreme conditions are required to grow GaN crystals and therefore a new type of chemical growth chamber was invented that is suitable for large-scale manufacturing. A new process was developed that grows GaN crystals at a rate that is more than double that of current processes. The new technology will enable GaN substrates with best-in-world quality at lowest-in-world prices, which in turn will enable new generations of white LEDs, lasers for full-color displays, and high-performance power electronics.

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GaN Substrate and GaN Homo-epitaxy for LEDs: Progress and Challenges*Project Supported by the National High Technology Research and Development Program of China (Grant No. 2014AA032605), the National Key Basic Research and Development Program of China (Grant Nos. 2012CB619304 and 2011CB301904), and the National Natural Science Foundation of China (Grant Nos. 61376012, 61474003, and 61327801).

GaN Substrate and GaN Homo-epitaxy for LEDs: Progress and Challenges*Project Supported by the National High Technology Research and Development Program of China (Grant No. 2014AA032605), the National Key Basic Research and Development Program of China (Grant Nos. 2012CB619304 and 2011CB301904), and the National Natural Science Foundation of China (Grant Nos. 61376012, 61474003, and 61327801).

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Abstract: After a brief review on the progresses in GaN substrates by ammonothermal method and Na-flux method and hydride vapor phase epitaxy (HVPE) technology,