Design for Manufacturability with Advanced Lithography

Released on by Bei Yu
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  • Design for Manufacturability with Advanced Lithography Book Detail

  • Author : Bei Yu
  • Release Date : 2015-10-28
  • Publisher : Springer
  • Genre : Technology & Engineering
  • Pages : 173
  • ISBN 13 : 3319203851
  • File Size : 96,96 MB
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Design for Manufacturability with Advanced Lithography by Bei Yu PDF Summary

Book Description: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

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