Handbook of Chemical Vapor Deposition

Released on by Hugh O. Pierson
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  • Handbook of Chemical Vapor Deposition Book Detail

  • Author : Hugh O. Pierson
  • Release Date : 1999-09-01
  • Publisher : William Andrew
  • Genre : Technology & Engineering
  • Pages : 507
  • ISBN 13 : 0815517432
  • File Size : 83,83 MB
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Handbook of Chemical Vapor Deposition by Hugh O. Pierson PDF Summary

Book Description: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

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Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition

File Size : 14,14 MB
Total View : 6618 Views
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at

Handbook of Chemical Vapor Deposition

Handbook of Chemical Vapor Deposition

File Size : 2,2 MB
Total View : 1769 Views
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor depos