Plasma Etching

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  • Plasma Etching Book Detail

  • Author : M. Sugawara
  • Release Date : 1998-05-28
  • Publisher : OUP Oxford
  • Genre : Technology & Engineering
  • Pages : 362
  • ISBN 13 : 0191590290
  • File Size : 58,58 MB

Plasma Etching by M. Sugawara PDF Summary

Book Description: The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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Plasma Etching

Plasma Etching

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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma ph

Dry Etching Technology for Semiconductors

Dry Etching Technology for Semiconductors

File Size : 86,86 MB
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This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniat

Dry Etching for VLSI

Dry Etching for VLSI

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This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each