Ion Implantation and Synthesis of Materials

Released on by Michael Nastasi
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  • Ion Implantation and Synthesis of Materials Book Detail

  • Author : Michael Nastasi
  • Release Date : 2007-05-16
  • Publisher : Springer Science & Business Media
  • Genre : Science
  • Pages : 271
  • ISBN 13 : 3540452982
  • File Size : 6,6 MB
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Ion Implantation and Synthesis of Materials by Michael Nastasi PDF Summary

Book Description: Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

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Ion Implantation and Synthesis of Materials

Ion Implantation and Synthesis of Materials

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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and c

Ion Implantation Techniques

Ion Implantation Techniques

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In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the appli

Ion Implantation Science and Technology

Ion Implantation Science and Technology

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Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. T

Ion Implantation

Ion Implantation

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Ion implantation is one of the promising areas of sciences and technologies. It has been observed as a continuously evolving technology. In this book, there is