Method and Apparatus for Improved High Power Impulse Magnetron Sputtering

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  • Method and Apparatus for Improved High Power Impulse Magnetron Sputtering Book Detail

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  • Release Date : 2013
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  • File Size : 37,37 MB
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Method and Apparatus for Improved High Power Impulse Magnetron Sputtering by PDF Summary

Book Description: A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.

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